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DECO 40-60 GaP decomposition source for Phosphorus (P2) , on a flange DN40 CF (O.D. 2.75"), with 60 cm³ PBN crucible and Ga-trapping PBN cap |
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The Decomposition Source - DECO - is an ultra pure source for P2 based on the decomposition of GaP. |
Ga-Trapping PBN cap on a DECO 63-125
PBN caps for DECO sources, different sizes |
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Ga-Trapping-Cap-System MBE-Komponenten produces a unique system which provides a very pure P2 beam by the decomposition of GaP. The Ga-Trapping-Unit, consisting of a few well designed parts, can be easily mounted on a standard effusion cell. The Ga-Trapping-Cap System is based on the sublimation of phosphorus from GaP. The parasitic Ga atoms are efficiently separated from the P2 beam. Thus a very pure P2 beam is produced. |
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![]() Equilibrium pressures of the components along the metal-rich boundary of the field of solidus of a Ga-P system [R.F.C. Farrow, J.Phys. D, 7, 2436 (1974)] |
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Application Typical applications of our decomposition sources based on the Ga-Trapping-Cap System are the
growth of phosphide compounds (GaInP, InP) in III-V MBE as well as Phosphorus doping (n-type) in Si MBE.
MBE-Komponenten GmbH provides well designed standard effusion cells with the Ga-Trapping-Cap System. This GaP decomposition source
DECO combines our most efficient heating system, known from our WEZ cells with the Ga-Trapping-Cap System. Thus a very stable and
reproducible P2 beam is achieved. Different DECO source designs are optimised for growth or for doping application.
The Ga-Trapping-Unit and the DECO can be used as an As2 or Sb2 source, too. Valved DECO sources with larger capacities are
available on request. Please ask for more information.
Growth Application (GA) For growth applications the DECO is optimised towards a high flux which requires high operation temperatures and maximized openings of the cap system. Also the cell is optimised to maximum crucible volume to allow long time operation. Doping Application (DA) For doping applications the DECO is optimised for lower temperature operation which allows a fast shutdown of the cell after the doping. The result is a well designed P doping source for Si MBE. ![]() SIMS measurement of phosphorus delta-doping in Si-MBE with a DECO40-10KS; (Datacourtesy of C.Tolksdorf, Physics Institute ET9, Uni-BW Munich) |
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Technical Data
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LAST UPDATE: NOVEMBER, 2004 |
© 2003 Dr. Eberl MBE-Komponenten GmbH |
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