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Dual Dopant Source for Si and Be on one DN63 CF flange,
with individual cell shutters and water cooling between the cells

• Cluster with all kinds of effusion cells
• Compatible with all MBE systems
• Compact and intelligent cell design
• Various crucibles available
• Solutions with integrated cooling shrouds and shutters

Dopant Sources provide a convenient method for adding MBE deposition capabilities into your UHV chamber or your MBE system. Because of the large variety of different UHV systems, each cluster is individually designed for our customer's system.

We build cluster source flanges based on our standard cells. We offer a large variety of clusters with two or more different cells mounted even on a small flange.
Specially designed thermal shielding including water-cooled shields between the individual cells reduce thermal interaction. Cross contamination is minimized by the use of individual, non-overlapping shutters.

In the following we present a brief selection of different cluster sources. Some possible applications for our cluster sources are shown as examples. Please contact us for more information about custom-made solutions.

A Double Doping Cluster Source used for Si and Be doping on a single DN63 CF (O.D. 4.5") port is presented in the picture on the right.
The use of our Double Cluster Source increases the capacity of your MBE System, e.g. GEN II, by using only a single port for both Be and Si doping. After melting the source material in an upwards position the cells can be used in downward ports. For easier melting of the source material we deliver a special set of PBN and Ta shielding parts.

Double Cluster Source for Si and Be doping
on a DN63 (O.D. 4.5") CF-flange, including
two cell shutters with soft-acting shutter modules

A double mini effusion cell cluster with 2 x 5.6 cm³ PBN crucibles and one rotary motion shutter are mounted on a DN40 CF (O.D. 2.75") flange.

Double MEZ Cluster Source on DN40 CF flange

The double MEZ cluster source with 2 x 5.6 cm³ PBN crucibles shown on the right is mounted on a DN63 CF (O.D. 4.5") flange. It is equipped with a special water cooling between the two mini effusion cells and with a rotary motion shutter for each cell.

Double MEZ Cluster Source on DN63 CF flange

The combination of a mini high temperature effusion cell HTEZ and a standard effusion cell WEZ, mounted on a DN63 CF (O.D. 4.5") flange is shown in the picture nearby.
The HTEZ includes an 1.5 cm³ Al₂O₃ crucible, while the WEZ is equipped with a 10 cm³ PBN crucible. The integrated water cooling shroud avoids heating of the chamber as well as thermal interaction of the individual cells. The two separate shutters allow independent operation with minimized cross contamination.

Mixed Cell Cluster Source on DN63 CF flange

Two single standard effusion cells WEZ, with a 10 cm³ PBN crucible in each cell, are mounted in an angled position to allow the use of a vertically oriented mounting flange. Each cell is equipped with an individual linear shutter.

Vertically mounted Cluster on DN100 CF flange

 LAST UPDATE: NOVEMBER, 2004

© 2003 Dr. Eberl MBE-Komponenten GmbH